Thursday, August 1st, 2013
SEOUL, KOREA - Jusung Engineering Co., Korea's semiconductor and display equipment maker, said on July 31 that it has won a patent infringement lawsuit against U.S. competitor Applied Materials in a Taiwanese appeals court following a win in the district court. The original complaint involves the plasma enhanced chemical vapor deposition (PECVD) process.
In the PECVD process, one or more gaseous reactors are used to form a solid insulating or conducting layer on the surface of a wafer enhanced by the use of a vapor containing electrically charged particles or plasma, at lower temperatures.
Applied Materials, the world's largest chip equipment manufacturer, had filed a suit against Jusung in 2003 claiming that the latter infringed on its PECVD patent. In 2011, the Taiwanese lower court cleared the Korean chip equipment maker of infringing the PECVD patent.
A Jusung Engineering official said, "By winning the appeals court verdict after the 2011 district court ruling, the originality of our technology has been again vindicated. It must be a lesson to large corporations using frivolous litigation as a tool for controlling small-sized competitors."
